Propter raritatem moissanite naturalis, maxime carbida pii synthetica est.Usus est ut abrasive, et recentius ut semiconductor et adamas simulans gemmae qualitatis.Processus fabricandi simplicissimus est arenam silicam et carbonem in Acheson graphite resistentia electrici fornacem calidissimam miscere, inter 1,600 °C (2,910 °F) et 2,500 °C (4,530 °F).Praeclara SiO2 particulae in materia plantae (eg rice siliquis) ad SiC converti possunt calefaciendo in excessu carbonis ex materia organica.Fumus silica, qui gignendo metallum siliconis et ferrosilicon gignit, verti potest etiam in SiC calefaciendo graphite ad 1,500 °C (2,730 °F).
F12-F1200, P12-P2500
0-1mm, 1-3mm, 6/10, 10/18, 200mesh, 325mesh
Aliae specificationes speciales suppleri possunt in rogatu.
Grit | Sic | FC | Fe2O3 |
F12-F90 | ≥98.50 | <0.20 | ≤0.60 |
F100-F150 | ≥98.00 | <0.30 | ≤0.80 |
F180-F220 | ≥97.00 | <0.30 | ≤1.20 |
F230-F400 | ≥96.00 | <0.40 | ≤1.20 |
F500-F800 | ≥95.00 | <0.40 | ≤1.20 |
F1000-F1200 | ≥93.00 | <0.50 | ≤1.20 |
P12-P90 | ≥98.50 | <0.20 | ≤0.60 |
P100-P150 | ≥98.00 | <0.30 | ≤0.80 |
P180-P220 | ≥97.00 | <0.30 | ≤1.20 |
P230-P500 | ≥96.00 | <0.40 | ≤1.20 |
P600-P1500 | ≥95.00 | <0.40 | ≤1.20 |
P2000-P2500 | ≥93.00 | <0.50 | ≤1.20 |
Grits | mole Density (g/cm3) | Princeps Density (g/cm3) | Grits | mole Density (g/cm3) | Princeps Density (g/cm3) |
F16 ~ F24 | 1.42~1.50 | ≥1.50 | F100 | 1.36~1.45 | ≥1.45 |
F30 ~ F40 | 1.42~1.50 | ≥1.50 | F120 | 1.34~1.43 | ≥1.43 |
F46 ~ F54 | 1.43~1.51 | ≥1.51 | F150 | 1.32~1.41 | ≥1.41 |
F60 ~ F70 | 1.40~1.48 | ≥1.48 | F180 | 1.31~1.40 | ≥1.40 |
F80 | 1.38~1.46 | ≥1.46 | F220 | 1.31~1.40 | ≥1.40 |
F90 | 1.38~1.45 | ≥1.45 |
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